Tip gas distributor
US7145099B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 16, 2004 |
| Grant date | Dec 5, 2006 |
| Priority date | — |
| Expiry date | Mar 16, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/3489
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A tip gas distributor is provided that preferably comprises a plurality of swirl holes and a plurality of secondary gas holes, wherein the swirl holes direct a plasma gas to generate a plasma stream, and the secondary gas holes direct a secondary gas to stabilize the plasma stream. Additionally, a tip gas distributor is provided that comprises swirl passages and secondary gas passages formed between the tip gas distributor and an adjacent component to generate and stabilize the plasma stream. Further, methods of generating and stabilizing the plasma stream are provided through the use of the swirl holes and passages, along with the secondary gas holes and passages.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.