Photo-thermal induced diffusion
US7145243B2 · kind B2 · utility
3Cited by
17References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 9, 2003 |
| Grant date | Dec 5, 2006 |
| Priority date | — |
| Expiry date | Nov 26, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/12715
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Formation of a mixed-material composition through diffusion using photo-thermal energy. The diffusion may be used to create electrically conductive traces. The diffusion may take place between material layers on one of a package substrate, semiconductor substrate, substrate for a printed circuit board (PCB), or other multi-layered substrate. The photo-thermal energy may be supplied by various devices, for example a YAG laser device, CO2 laser device, or other energy source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.