Apparatus and method of exposing light to a semiconductor device having a curved surface
US7145633B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 9, 2003 |
| Grant date | Dec 5, 2006 |
| Priority date | — |
| Expiry date | Jan 9, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/703
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A semiconductor manufacturing station (50) exposes light on a surface area of a spherical semiconductor device or ball (52). A mask pattern generator (56) provides a pattern of light, which undergoes temporal changes to collectively represent an image. The mask pattern generator has an active exposure contour (80) that provides a portion of the overall image. The pattern of light is directed though a lens (62) to the surface area of the semiconductor device. The semiconductor device rotates in relation to the temporal changes in the pattern of light to expose the pattern of light over a portion of a surface area of the semiconductor device. The exposure contour has a narrower center and becomes wider moving away from the center. The exposure contour may have a curvature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.