Anti-reflective structures
US7145721B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 2, 2001 |
| Grant date | Dec 5, 2006 |
| Priority date | — |
| Expiry date | Nov 2, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/50
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An anti-reflective structure is formed on a surface to transmit incident light with minimal losses. The anti-reflective surface has a plurality of protrusions having a feature size smaller than the wavelength of incident light. The protrusions increase in height in either a sloped linear manner or in a curvilinear manner, and the protrusions repeat across the surface in at least one dimension to transmit the incident light. Gray scale lithography may be used to produce these patterns of protrusions in photoresist layers. High fidelity transfer of the protrusion patterns into the surfaces is accomplished by utilizing, for example, an electron cyclotron resonance plasma. Transmission values at such patterned surfaces maybe as high as 99.3%.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.