Cu-based amorphous alloy composition
US7147727B2 · kind B2 · utility
11Cited by
1References
1Claims
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Key dates
| Filing date | Jun 25, 2004 |
| Grant date | Dec 12, 2006 |
| Priority date | — |
| Expiry date | Jun 25, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC22C30/04
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The present invention relates to a Cu-based amorphous alloy composition having a chemical composition represented by the following general formula, by atomic %: Cu100-a-b-c-dZraAlb(M1)c(M2)d, where a, b, c and d satisfy the formulas of 36≦a≦49, 1≦b≦10, 0≦c≦10, and 0≦d≦5, respectively, and c and d are not zero at the same time, and M1, the 4th element added to a ternary alloy of Cu—Zr—Al, is one metal element selected from the group consisting of Nb, Ti, Be and Ag, and M2, the 5th element added to the ternary alloy of the Cu—Zr—Al, is one amphoteric element or non-metal element selected from the group consisting of Sn and Si.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.