Process for electrochemical deposition of tantalum and an article having a surface modification
US7150818B2 · kind B2 · utility
1Cited by
3References
10Claims
0Family size
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Key dates
| Filing date | Feb 26, 2002 |
| Grant date | Dec 19, 2006 |
| Priority date | — |
| Expiry date | Apr 12, 2023 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61L2430/02
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A process for electrochemical deposition of tantalum on an article in an inert, non-oxidizing atmosphere, or under vacuum, in a molten electrolyte containing tantalum ions, comprising the steps of: immersing the article into the molten electrolyte heated to a working temperature, passing an electric current through the electrolyte to thereby deposit a tantalum coating on the article, wherein the process of tantalum deposition at least in an initial phase deposits pure α-tantalum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.