Pressure monitor incorporating saw device
US7151337B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 17, 2003 |
| Grant date | Dec 19, 2006 |
| Priority date | — |
| Expiry date | Mar 17, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01L9/0025
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A pressure monitor has a base and a lid secured to the base to define a substantially fluid tight chamber. At least part of the lid is flexible and forms a diaphragm which deflects responsive to changes in fluid pressure surrounding the monitor. A projection provided on the diaphragm transmits movement thereof to a distortable substrate located within the chamber. A first SAW device is mounted on the distortable substrate, and at least a second and third SAW device are mounted within the chamber. The second SAW device carried on a reference substrate section has its direction of propagation inclined at an angle to the direction of propagation of at least one of the first and third SAW devices. This way movement of the diaphragm induced by a change in pressure in the zone surrounding the monitor results in distortion of the distortable substrate, which is measurable by the SAW device mounted thereon, without distorting said reference substrate section.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.