Suppression of the formation of noxious substances during chloride processes
US7153488B2 · kind B2 · utility
3Cited by
15References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 3, 2004 |
| Grant date | Dec 26, 2006 |
| Priority date | — |
| Expiry date | Mar 24, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01G23/07
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The present invention is directed to the suppression of the formation noxious compounds such as furans. According to the present invention, a venturi device is used to rapidly quench a chlorinator reaction gas. The rapid quench minimizes the resonance time that furan precursors are at conditions conducive to furan formation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.