Radiation-sensitive compositions and imageable materials
US7153632B1 · kind B1 · utility
4Cited by
5References
23Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 3, 2005 |
| Grant date | Dec 26, 2006 |
| Priority date | — |
| Expiry date | Aug 3, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation-sensitive composition includes a radically polymerizable component that comprises carboxy groups, an initiator composition to generate radicals, and a polymeric binder comprising poly(alkylene oxide) segments and optionally pendant cyano groups. This composition can be used to prepare imageable elements such as negative-working, on-press developable printing plate precursors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.