Method of locating areas in an image such as a photo mask layout that are sensitive to residual processing effects
US7155698B1 · kind B1 · utility
37Cited by
5References
26Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 17, 2003 |
| Grant date | Dec 26, 2006 |
| Priority date | — |
| Expiry date | Jan 21, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Images such as mask layouts, signatures, and photographs are compared to identify similarities or dissimilarities in the images. Descriptions of the images use geometric shapes including lines, rectangles, and triangles to facilitate the comparisons and decrease comparison time and decrease stored data describing the shapes. Data for pixels in the shapes are pre-integrated to reduce arithmetic operations in the comparisons.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.