Implant

US7156858B2 · kind B2 · utility

Assignee

• Ethicon G.m.b.H. · DE

Inventors

• Barbara Schuldt-Hempe · Bad Bramstedt, DE
• Christoph Walther · Kattendorf, DE

Key dates

• Filing date: Feb 21, 2001
• Grant date: Jan 2, 2007
• Expiry date: Feb 19, 2022

Classification

• Technology area (CPC D): Textiles; Paper
• CPC primary: D10B2509/08
• WIPO field: Medical technology
• WIPO sector: Instruments

Abstract

An implant (1) has an areal basic structure made from weft-knitted or warp-knitted fabric which has a greater extendability in a central area (3) than in the peripheral area (4) of the implant (1). The basic structure can be deformed in the central area (3) of the implant (1) to produce a projection (30) into the third dimension. The implant (1) preferably has a stiffening structure (22, 24) in the area of the free end (32) of the projection (30). The implant (1) is particularly suitable for treating hernias.