Optical method of examining reliefs on a structure
US7158239B2 · kind B2 · utility
5Cited by
7References
7Claims
0Family size
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Key dates
| Filing date | Dec 22, 2003 |
| Grant date | Jan 2, 2007 |
| Priority date | — |
| Expiry date | Mar 6, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/24
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for studying a surface provided with relief features, wherein a measurement spectrum is taken and then compared with test spectra representative of arbitrary structures that are adjusted stepwise. A correlation over representative points of the spectra is selected while optimizing the determination by a hierarchized adjustment of the parameters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.