Electro-optical device, manufacturing method of the same, and electronic apparatus
US7158694B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 27, 2004 |
| Grant date | Jan 2, 2007 |
| Priority date | — |
| Expiry date | Jun 18, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S385/901
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
To provide an electro-optical device in which the fluidity of a material for forming the underlying layer of a gas barrier layer is controlled, and the volume-change of the underlying layer is suppressed, so that stress-concentration on the gas barrier layer is relaxed, and to provide a method of producing the same and an electronic apparatus. In an electro-optical device 1 having, on a substrate 200, a plurality of first electrodes 23, a bank structure 221 having a plurality of openings 221a positioned correspondingly to the formed first electrodes 23, electro-optical layers 60 arranged in the respective openings, and a second electrode 50 covering the bank structure 221 and the electro-optical layers 60, the device 1 includes a buffer layer 210 formed so as to cover the second electrode 50 and have a substantially flat upper surface, and a gas barrier layer 30 covering the buffer layer 210.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.