Patent · US Expired

Method for rapid prototyping by using linear light as sources

US7158849B2 · kind B2 · utility

40Cited by
2References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 28, 2004
Grant dateJan 2, 2007
Priority date
Expiry dateOct 28, 2024

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB33Y30/00
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

A method for rapid prototyping by using linear light as sources employs DLP (Radiation Hardening Formation) or LCD, together with the portable devices and linear light source to treat the raw material in two stages. The first stage is to spread the raw material to a selected zone by nozzles or rollers and illuminating the material to let the material being processed and have physical o mechanical changes. The second stage is to use more powerful linear light source with the cooperation of the portable DMD (Digital Micromirror Device) or LCD (Liquid Crystal Display) to illuminate the material to make it have a second times of physical o mechanical changes. By the piling up the layers of the material, a complete 3-D work piece is obtained.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.