Reactor for plasma assisted treatment of gaseous
US7163663B2 · kind B2 · utility
7Cited by
9References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 15, 2002 |
| Grant date | Jan 16, 2007 |
| Priority date | — |
| Expiry date | Apr 25, 2022 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF01N2240/28
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma reactor (11) of the silent discharge or dielectric barrier type for treatment of a gaseous medium is provided with a layer of material (34) positioned to present a surface extending along at least part of the length of the gas flow path. Particulates or selected species are entrapped on the surface. A preferred electrode arrangement provides surface discharge in the plasma at the surface of the layer of material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.