Patent · US Expired

Photosensitive material and process of making same

US7163769B2 · kind B2 · utility

3Cited by
9References
23Claims
0Family size

Inventors

Key dates

Filing dateMar 11, 2003
Grant dateJan 16, 2007
Priority date—
Expiry dateMar 11, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03H2270/53
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A photosensitive material, suitable for image-wise recording, e.g., holographic recording of data or other information, comprises an organic species in an organic-inorganic matrix, the organic species comprising a material having a refractive index which changes upon exposure to actinic radiation. The organic-inorganic matrix may be an organically modified glass. The photo-sensitive material may be made using the sol-gel process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.