Laser CVD device and laser CVD method
US7166167B2 · kind B2 · utility
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11References
2Claims
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Key dates
| Filing date | Jun 20, 2003 |
| Grant date | Jan 23, 2007 |
| Priority date | — |
| Expiry date | Sep 29, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32339
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A laser CVD device capable of tightening adhesion of a film formed by laser CVD to a film formation face of a substrate and preventing cracks from occurring in the film itself is to be provided. The device comprises a plasma pretreating unit for turning pretreating gas into a plasma state by arc discharge and for supplying the plasma sate gas to the film formation face; and a film forming unit having means for sealing film forming gas while being isolated from an external atmosphere, means for radiating a laser beam to the film forming gas, wherein the film is formed over the film formation face of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.