Method for producing a solid body including a microstructure

US7166232B2 · kind B2 · utility

Assignee

• Micronas GmbH · DE

Inventors

• Guenter Igel · Teningen, DE
• Mirko Lehmann · Glückstadt, DE

Key dates

• Filing date: Dec 21, 2000
• Grant date: Jan 23, 2007
• Expiry date: Apr 10, 2021

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S438/947
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

According to a method for producing a solid body (1) including a microstructure (2), the surface of a substrate (3) is provided with a masking layer (6) that is impermeable to a substance to be applied. The substance is then incorporated into the substrate regions not covered by the masking layer (6). A heat treatment is used to diffuse the substance into a substrate region covered by the masking layer (6) such that a concentration gradient of the substance is created in the substrate region covered by the masking layer (6), proceeding from the edge of the masking layer (6) inward with increasing distance from the edge. The masking layer (6) is then removed to expose the substrate region under this layer, and a near-surface layer of the substrate (3) in the exposed substrate region is converted by a chemical conversion reaction into a coating (9) which has a layer thickness profile corresponding to the concentration gradient of the substance contained in this near-surface layer. A supplementary treatment is implemented in a subsection of the coating (9) in which the thickness of the coating (9) is reduced.