Very high energy, high stability gas discharge laser surface treatment system
US7167499B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 18, 2004 |
| Grant date | Jan 23, 2007 |
| Priority date | — |
| Expiry date | Jul 31, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S2301/08
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in the substrate of a workpiece is disclosed which may comprise, a multichamber laser system comprising, a first laser unit comprising, a first and second gas discharge chamber; each with a pair of elongated spaced apart opposing electrodes contained within the chamber, forming an elongated gas discharge region; a laser gas contained within the chamber comprising a halogen and a noble gas selected to produce laser light at a center wavelength optimized to the crystallization process to be earned out on the workpiece; a power supply module comprising, a DC power source; a first and a second pulse compression and voltage step up circuit connected to the DC power source and connected to the respective electrodes, comprising a multistage fractional step up transformer having a plurality of primary windings connected in series and a single secondary winding passing through each of the plurality of primary windings, and a solid state trigger switch; and a laser timing and control module operative to time the closing of the respective solid state switch based upon …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.