Patent · US Expired

Aqueous dispersion, process for its production and use

US7169322B2 · kind B2 · utility

8Cited by
12References
2Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 21, 2002
Grant dateJan 30, 2007
Priority date
Expiry dateAug 6, 2023

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/2993
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

Aqueous dispersion containing a silicon-aluminum mixed oxide powder, the powder containing 0.1 to 99.9 wt. % Al2O3 and Si—O—Al-bonds. The dispersion can be produced using dispersing and/or grinding devices which a achieve an energy input of at least 200 KJ/m3. The dispersion can be used for the chemical-mechanical polishing of semiconductor substrates.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.