Aqueous dispersion, process for its production and use
US7169322B2 · kind B2 · utility
8Cited by
12References
2Claims
0Family size
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Key dates
| Filing date | Feb 21, 2002 |
| Grant date | Jan 30, 2007 |
| Priority date | — |
| Expiry date | Aug 6, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2993
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Aqueous dispersion containing a silicon-aluminum mixed oxide powder, the powder containing 0.1 to 99.9 wt. % Al2O3 and Si—O—Al-bonds. The dispersion can be produced using dispersing and/or grinding devices which a achieve an energy input of at least 200 KJ/m3. The dispersion can be used for the chemical-mechanical polishing of semiconductor substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.