Blocked aliphatic thiol stabilizers for photothermographic materials
US7169543B2 · kind B2 · utility
3Cited by
18References
21Claims
0Family size
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Key dates
| Filing date | Dec 29, 2004 |
| Grant date | Jan 30, 2007 |
| Priority date | — |
| Expiry date | Feb 16, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/167
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photothermographic materials contain one or more blocked aliphatic thiol compounds in an amount of at least 1 mg/m2 as stabilizers. These compounds have a calculated octanol-water partition coefficient (c log P value) of 2.0 or greater, and an N value equal to or greater than 6.5.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.