Method of producing a calibration wafer

US7169717B2 · kind B2 · utility

Assignee

• Mattson Thermal Products GmbH · US

Inventors

• Christoph Merkl · Senden, DE
• Markus Hauf · Ulm, DE
• Rolf Bremensdorfer · Bibertal, DE

Key dates

• Filing date: Nov 13, 2003
• Grant date: Jan 30, 2007
• Expiry date: Nov 13, 2023

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L22/34
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A method of producing a calibration wafer having at least a predetermined emissivity, including providing a wafer of semiconductor material; subjecting the bulk material of the wafer to doping with foreign atoms and/or generating lattice defects to obtain the predetermined emissivity; and coating the wafer to obtain a further optical characteristic.