Dicopper(I) oxalate complexes for use as precursor substances in metallic copper deposition

US7169947B2 · kind B2 · utility

Assignee

• BASF SE

Inventors

• Katrin Koehler · Oettingen, DE
• Franc Meyer · Oettingen, DE

Key dates

• Filing date: Jun 5, 2003
• Grant date: Jan 30, 2007
• Expiry date: Jun 5, 2023

Classification

• Technology area (CPC H): Electricity
• CPC primary: H05K3/105
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

The invention relates to dicopper(I) oxalate complexes stabilised by neutral Lewis base components and to the use thereof as precursors for the deposition of metallic copper. The neutral Lewis bases used are alkynes or alkenes containing at least one silyl or ester group, or nitrites, saturated or unsaturated nitrogen ligands, phosphites, trialkyl-phosphines or oxygen- or sulfur-containing ligands.