Patent · US Expired

Process for creating a 3-dimensional configuration on a substrate

US7169989B2 · kind B2 · utility

6Cited by
1References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 1, 2004
Grant dateJan 30, 2007
Priority date
Expiry dateNov 1, 2024

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/902
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

The invention provides a process for introducing a three-dimensional configuration of micron to sub-micron size in a polymeric substrate comprising applying a catalyst for the selective removal of sub-unit parts of the polymer to at least one predetermined area of the polymer substrate via a pipette with a nano-sized orifice.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.