Nanostructure antireflection surfaces
US7170666B2 · kind B2 · utility
10Cited by
4References
25Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 27, 2004 |
| Grant date | Jan 30, 2007 |
| Priority date | — |
| Expiry date | Mar 2, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B1/113
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An antireflection surface formed using a plurality of nanostructures of a first material on a surface of a second material. The first material is different from the second material. The distribution of spatial periods of the nanostructures is set by a self-assembly operation. The surface of the second material is converted to operate as a graded index surface that is substantially antireflective for the wavelength of interest.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.