Face mask and method of manufacturing the same
US7171967B2 · kind B2 · utility
15Cited by
25References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 25, 2003 |
| Grant date | Feb 6, 2007 |
| Priority date | — |
| Expiry date | Sep 26, 2024 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA41D13/1123
- WIPO fieldOther consumer goods
- WIPO sectorOther fields
Abstract
A mask includes a filter layer and a support base supporting the filter layer. The filter layer has first and second complimentary portions that together form a rim, where the first portion is connected to the second portion at first and second seams. The first seam extends from the rim to a first pleat, while the second seam extends from the rim to a second pleat. The first pleat is connected to the second pleat by an unpleated central portion. The first pleat, second pleat and unpleated central portion are formed by the first and second portions of the filter layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.