Patent · US Expired

SiO2-TiO2 glass body with improved resistance to radiation

US7172983B2 · kind B2 · utility

1Cited by

6References

20Claims

0Family size

Assignee

Schott AG · DE

Inventors

Jochen Alkemper · Klein-Winternheim, DE
Joerg Schuhmacher · Mainz, DE
Hrabanus Hack · Mainz, DE
Oliver Sohr · Idar-Oberstein, DE

Key dates

Filing date	Mar 23, 2005
Grant date	Feb 6, 2007
Priority date	—
Expiry date	Mar 23, 2025

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC03C2203/50
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

The invention discloses an SiO2—TiO2 glass, which is preferably made by flame-hydrolysis and which distinguishes itself by increased resistance to radiation, especially in connection with EUV lithography. By purposefully reducing the hydrogen content, clearly improved resistance to radiation and reduced shrinking is achieved.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.