Refurbishing spent sputtering targets
US7175802B2 · kind B2 · utility
34Cited by
5References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 16, 2002 |
| Grant date | Feb 13, 2007 |
| Priority date | — |
| Expiry date | Sep 16, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB22F2998/10
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Spent sputtering targets are refurbished by filling the depleted region of the target with new sputter material using a hot isostatic pressing or HIP'ing technique.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.