Cold antireflection layer deposition process
US7175878B2 · kind B2 · utility
4Cited by
8References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 26, 2001 |
| Grant date | Feb 13, 2007 |
| Priority date | — |
| Expiry date | Nov 26, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24942
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate (1) at a temperature lower than 150° C., comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF2 (4, 4′), preparing the surface of the thus coated substrate, and depositing an outer MgF2 layer (5) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.