Surface treatment system and method
US7175880B2 · kind B2 · utility
0Cited by
14References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 28, 2002 |
| Grant date | Feb 13, 2007 |
| Priority date | — |
| Expiry date | Feb 5, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/54
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A surface treatment system in which gas for a deposition reaction is injected into a deposition chamber and power is applied to form a deposition reaction to form a deposition layer at a surface of an object or surface treatment, wherein the deposition chamber has a plurality of deposition spaces disposed in parallel and a convey unit for conveying one or more objects of surface treatment to each deposition space or discharging the objects of surface treatment from each deposition space after a deposition reaction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.