Patent · US Expired

Functional multilayer film and method for manufacturing the same

US7177519B2 · kind B2 · utility

0Cited by
14References
24Claims
0Family size

Assignees

Inventors

Key dates

Filing dateDec 3, 2003
Grant dateFeb 13, 2007
Priority date
Expiry dateDec 3, 2023

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24917
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A functional multilayer film and a method for manufacturing the same is provided in which the intervals of fine metallic bodies in the thickness direction and the arrangement thereof in the surface direction are regular, and the fine metallic bodies arranged on each layer are aligned in the thickness direction.A functional multilayer film is obtained by fixing a plurality of fine metallic bodies to a matrix made of a dielectric substance. The matrix is obtained by laminating metal-arranged thin films, which each contain a dielectric thin film having a predetermined thickness and the fine metallic bodies arranged on the dielectric thin film. A plurality of recesses is regularly formed on the surface of the dielectric thin film, and the fine metallic bodies are arranged in the lower parts of the recesses.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.