Spacer fabrication process for manufacturing reflective stealth mirrors and other MEMS devices
US7180651B2 · kind B2 · utility
1Cited by
3References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 2, 2004 |
| Grant date | Feb 20, 2007 |
| Priority date | — |
| Expiry date | Dec 2, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/0833
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for use in manufacturing a microelectromechanical system, such as a reflective stealth mirror includes the steps of: forming an I-shape mirror structure; forming a spacer layer over the I-shape mirror structure; and patterning the spacer layer to form at least one spacer along a side of the I-shape mirror structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.