Cantilever microstructure and fabrication method thereof
US7182876B2 · kind B2 · utility
3Cited by
6References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 8, 2004 |
| Grant date | Feb 27, 2007 |
| Priority date | — |
| Expiry date | Sep 8, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B2005/0021
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
In the present invention, disclosed are a cantilever microstructure and a fabrication thereof comprising a base plate; a cantilever beam extended from one surface of the base plate to outside so that a part thereof can be suspended, and formed of a silicon nitride material, and a probing tip formed at a front end of one surface of the cantilever beam, whereby the thickness of the cantilever beam becomes uniform and the mechanical and electrical characteristic thereof are improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.