Electro-optical device, manufacturing method of the same, and electronic apparatus
US7183580B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 27, 2004 |
| Grant date | Feb 27, 2007 |
| Priority date | — |
| Expiry date | Aug 27, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K59/122
Abstract
To provide an electro-optical device having a buffer layer which planarizes a gas barrier layer so that stress-concentration in the gas barrier layer is reduced, the buffer layer being prevented from leaking out of a predetermined area, and to provide a method of producing the same and an electronic apparatus. In an electro-optical device 1 having, on a substrate 200, a plurality of first electrodes 23, a bank structure 221 having a plurality of openings 221a positioned correspondingly to the formed first electrodes, electro-optical layers 60 arranged in the respective openings 221a, and a second electrode 50 covering the bank structure 221 and the electro-optical layers 60, the device includes a buffer layer 210 formed so as to cover the second electrode 50 and have a substantially flat upper surface, a frame 215 made of a material having no affinity to the buffer layer 210 and surrounding the periphery of the buffer layer 210, and a gas barrier layer 30 covering the buffer layer 210 and the frame 215.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.