Nanofabrication
US7189435B2 · kind B2 · utility
196Cited by
7References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 14, 2002 |
| Grant date | Mar 13, 2007 |
| Priority date | — |
| Expiry date | Oct 8, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi-scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.