Method for the manufacture of an active matrix, corresponding electro-optical display devices and mask
US7189496B2 · kind B2 · utility
3Cited by
7References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 6, 2003 |
| Grant date | Mar 13, 2007 |
| Priority date | — |
| Expiry date | May 11, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/13625
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a method for the manufacture of an active matrix for an electro-optical display device, the active zone exposure fields CH1, CH2 are obtained by the transfer of an active zone mask in such a way that there is a non-null overlap zone zl, zr, zt, zb between two successive exposure fields. The active zone mask is exposed a first time. This mask is positioned for the next exposure so as to overlap the first exposed field on a certain width F1, F2. In the overlap zones, an exposure of the mask provides only a part of the patterns.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.