Micromachine and manufacturing method
US7189625B2 · kind B2 · utility
0Cited by
8References
8Claims
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Assignee
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Key dates
| Filing date | Oct 4, 2005 |
| Grant date | Mar 13, 2007 |
| Priority date | — |
| Expiry date | Oct 4, 2025 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/112
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
In a micromachine according to this invention, a polyimide film is formed on the surface of each electrode. The polyimide film is formed as follows. A substrate having each electrode and a counterelectrode are dipped in an electrodeposition polyimide solution, and a positive voltage is applied to the electrode. A material dissolved in the electrodeposition polyimide solution is deposited on a surface of the positive-voltage-applied electrode that is exposed in the solution, thus forming a polyimide film on the surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.