Radio frequency identification device implemented with a metal-gate semiconductor fabrication process
US7191953B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 1, 2005 |
| Grant date | Mar 20, 2007 |
| Priority date | — |
| Expiry date | Oct 7, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06K19/0723
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The present invention discloses a radio frequency identification device implemented with a metal-gate semiconductor fabrication process, wherein the charge capacitor, which is formed by the special parasitic N-type and P-type guard rings in the chip fabricated with the metal-gate process, incorporated with the original P-type and N-type transistors of metal oxide semiconductor (PMOS/NMOS) not only can provide a horizontal surface current but also can provide a rectified current for the performance of the entire circuit, which can advance the metal gate process to RFID industry in cooperation with an identification code holder circuit and a non-synchronous local oscillation circuit so that the fabrication cost can be lowered and the fabrication time can be shortened.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.