Process for producing phosphor and plasma display panel unit
US7192325B2 · kind B2 · utility
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Key dates
| Filing date | Feb 19, 2004 |
| Grant date | Mar 20, 2007 |
| Priority date | — |
| Expiry date | Jun 27, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2211/42
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Fine particles of a phosphor are weighed, mixed, and filled. Provided after this step are at least one step of firing the particles in a reducing atmosphere, and a step of pulverizing, dispersing, rinsing, drying and then performing oxygen ion implantation treatment for implanting oxygen ions and annealing the particles, after the step of treatment in the reducing atmosphere. This method recovers oxygen vacancy in the host crystal of the phosphor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.