Thin layer of hafnium oxide and deposit process
US7192623B2 · kind B2 · utility
24Cited by
8References
15Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 27, 2003 |
| Grant date | Mar 20, 2007 |
| Priority date | — |
| Expiry date | Dec 12, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31678
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A thin layer of hafnium oxide or stacking of thin layers comprising hafnium oxide layers for producing surface treatments of optical components, or optical components, in which at least one layer of hafnium oxide is in amorphous form and has a density less than 8 gm/cm3. The layer is formed by depositing on a substrate without energy input to the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.