Methods and systems for processing a device, methods and systems for modeling same and the device
US7192846B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 9, 2005 |
| Grant date | Mar 20, 2007 |
| Priority date | — |
| Expiry date | May 9, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/0026
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.