Method for generating gas plasma
US7193369B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 20, 2003 |
| Grant date | Mar 20, 2007 |
| Priority date | — |
| Expiry date | Feb 20, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for generating a plasma. A gas flows along a flow path having the displacement identical to the lines of magnetic force of the main magnetic field, and high frequency alternating current is applied to the gas, thereby generating a gas plasma. For example, a gas is flowed through a pipe in a first direction. Electricity is conducted through the pipe in substantially the first direction. And a magnetic field is applied along a second direction (e.g., perpendicular to the first direction) to the gas flowing in the pipe such that a plasma is induced in the pipe.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.