Micro mirror and method of manufacturing the same
US7194152B2 · kind B2 · utility
1Cited by
0References
11Claims
0Family size
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Key dates
| Filing date | Aug 15, 2005 |
| Grant date | Mar 20, 2007 |
| Priority date | — |
| Expiry date | Aug 15, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/4214
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A micro mirror and a method of manufacturing the same are provided. The micro mirror includes a silicon substrate having a first slant plane and a second slant plane that face each other, and a clad layer including a first mirror surface and a second mirror surface respectively formed on the first slant plane and the second slant plane, wherein the clad layer reflects light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.