Device and method in connection with the production of structures
US7195734B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 4, 2000 |
| Grant date | Mar 27, 2007 |
| Priority date | — |
| Expiry date | Dec 1, 2021 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41M1/06
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Device in connection with the lithography of structures of nanometer size, which device comprises a first main part (1) with a first principally plane surface (2a) and a second main part (3) with a second principally plane surface (9a), said first surface and second surface being opposite to one another and being arranged in principle parallel in relation to one another, with an adjustable interval between them, and said first and second surface being arranged to form a support for a substrate (5) and a template (10) respectively, or vice-versa. According to the invention, said second main part (3) also comprises a cavity (6) for a medium, and means for adjusting a pressure of said medium, a wall of said cavity consisting of a flexible membrane (9), of which one side, which side faces away from the cavity (6), forms said second surface (9a). The invention also relates to a method that utilizes the device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.