Multiresolution geometry caching based on ray differentials with stitching
US7196704B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 10, 2005 |
| Grant date | Mar 27, 2007 |
| Priority date | — |
| Expiry date | May 18, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2210/36
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for rendering a plurality of objects. The method includes receiving ray differential information associated with a ray, determining a first ray differential based on at least information associated with the ray and a first surface patch, and determining a first resolution based on at least information associated with the first ray differential and the first surface patch. Additionally, the method includes obtaining a first geometry representation based on at least information associated with the first surface patch and the first resolution, and obtaining a second geometry representation associated with a second surface patch tessellated at a second resolution. Moreover, the method includes determining whether there is at least one patch crack between the first geometry representation and the second geometry representation, and if there is the at least one patch crack, performing a stitching process to the first geometry representation and the second geometry representation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.