Patent · US Expired

Method of alignment of liquid crystals comprising exposing an alignment material to an interference pattern

US7196758B2 · kind B2 · utility

65Cited by
14References
30Claims
0Family size

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Key dates

Filing dateDec 30, 2003
Grant dateMar 27, 2007
Priority date
Expiry dateMar 20, 2024

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02F1/133788
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method includes exposing an alignment material to an interference pattern to cause a chemical reaction in the alignment material and exposing the alignment material to a liquid crystal, where the liquid crystal aligns relative to the alignment material based on the interference pattern.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.