Optimization of sample plan for overlay
US7197722B2 · kind B2 · utility
8Cited by
0References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 30, 2004 |
| Grant date | Mar 27, 2007 |
| Priority date | — |
| Expiry date | Sep 20, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70633
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention describes a method including: determining field-clustering scheme; selecting initial sample plan; establishing initial model of overlay, the initial model of overlay comprising components; and establishing efficient model of overlay from the initial model of overlay including: constructing matrices; identifying redundant components and eliminating the redundant components; and identifying highly-correlated components and determining whether to eliminate the highly-correlated components.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.