Low-solvent, OH-functional dispersions

US7199178B2 · kind B2 · utility

Inventors

• Martin Melchiors · Leverkusen, DE
• Thomas Munzmay · Dormagen, DE
• Thomas Stingl · Montabaur, DE
• Hartmut Ottensmann · Mülheim an der Ruhr, DE
• Heinz-Dietmar Gewiss · Meerbusch, DE

Key dates

• Filing date: Jan 24, 2005
• Grant date: Apr 3, 2007
• Expiry date: Jan 24, 2025

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C08L2666/04
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

A process for preparing copolymer dispersions that includes subjecting A) one or more vinyl monomer mixtures containing a) OH-free (meth)acrylic esters and/or vinylaromatics, b) hydroxy-functional vinyl monomers and/or hydroxy-functional (meth)acrylic esters, c) ionic and/or potentially ionic monomers capable of free-radical copolymerization, and d)optionally further monomers, other than the compounds of components a)–c), capable of free-radical copolymerization; to free-radical polymerization in the presence of e) compounds according to formula (I)where R1 is an aliphatic, araliphatic or aromatic radical having 1 to 18 carbon atoms, R2 is H or CH3, R3, R4 are identical or different aliphatc radicals having 1 to 7 carbon atoms and n is 1 to 4; and subsequently dispersing the resultant copolymer B) before or after addition of a neutralizing agent C) in water. The resulting dispersions can be used to coat substrates.