Charged-particle beam instrument
US7202476B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 7, 2006 |
| Grant date | Apr 10, 2007 |
| Priority date | — |
| Expiry date | Mar 7, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A charged-particle beam instrument is offered which can inspect side and rear surfaces of a sample. Two electron optical microscope columns are mounted in a vacuum chamber. Each of the microscope columns has an electron gun, a condenser lens system, a deflector, and a secondary electron detector. A sample stage assembly on which a sample is placed is mounted in the vacuum chamber. The stage assembly consists of a rotary stage, an X-stage, and a Y-stage. One of the microscope columns is placed in a position where the electron beam from the column can scan at least an upper part of a side surface of the sample. The other microscope column is placed in a position where the beam from the column can scan at least a lower part of the side surface of the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.