Patent · US Expired

Giant magnetoresistance structure

US7202544B2 · kind B2 · utility

1Cited by

5References

2Claims

0Family size

Assignee

Robert Bosch GmbH · DE

Inventors

Detlef Gruen · Reutlingen, DE
Frank Fischer · Mesa, US
Henrik Siegle · Leonberg, DE
Peter Hein · Bamberg, DE

Key dates

Filing date	Jan 25, 2002
Grant date	Apr 10, 2007
Priority date	—
Expiry date	Jan 25, 2022

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB82Y25/00
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

The present invention relates to a method for producing a GMR structure in which a metallic multiple layer is applied onto a carrier and in which the metallic multiple layer is patterned to produce the GMR structure, the carrier having a structure before the metallic multiple layer is applied and the patterning of the metallic multiple layer is performed by CMP. The present invention also relates to a GMR structure having a carrier and a patterned metallic multiple layer positioned on the carrier, the patterned metallic multiple layer being situated in one or more depressions of the carrier. In addition, the present invention relates to a use of GMR structures.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.